3M
7000144557
3M™ Pad Conditioner Brush PB33A-1, 4.25 in dia
Specifications
| Application | Advanced Node (Memory & Logic), CMP, Pad Cleaning, Wafer Manufacturing |
|---|---|
| Brand | 3M™ |
| COO | United States |
| Long Description | Engineered specifically for chemical mechanical polishing (CMP) pad cleaning applications, our 3M™ CMP Pad Conditioner Brush is excellent for efficient pad cleaning and slurry distribution which helps manufacturers reduce cost of ownership in semiconductor operations. These 3M CMP brushes are part of a full range of 3M CMP solutions. |
| Product Type | Industrial Supplies |
| Short Description | PB33A-1 PAD Condition Brush, 4.25 IN |